EON R Pant Multicam®

Designed with the latest in technology and materials, the EON R Pants are the perfect choice for those who want the best in tactical pants. With a 6.5 oz. Rip-stop fabric, 50% nylon / 50% cotton fade resistant, self-adjusting waist, internal ventilation system, cargo pockets with additional pockets inside, can conceal a water bottle or rifle magazine, and reinforced seat and knees, these pants are perfect for any situation. The EON R Pants have a wide range of features that make them ideal for any situation. Whether you're on a mission or just heading to the range, these pants will have you covered. The lastest technology in design and materials applied to tactical pants.  US Made  6.5 oz. (185 grams.) NyCo MIL-DTL-44436B, Class 11 (Original Pattern) rip-stop Cordura® fabric. 50% nylon/50% cotton fade resistant fabric. Easy-Fit™ self-adjusting waist. Internal ventilation system. Cargo pockets with additional pockets inside. Reinforced seat and knees. Cargo pockets that can conceal a water bottle or rifle magazine.  Knife or flash light pocket with access to the cargo pockets. Six 1”x 3” belt loops. Stretch back rise for comfort and adjustment. 10 fully functional pockets. U.S. made YKK® zippers. Fully adjustable pant with waist, leg opening and length adjusters for maximum comfort. Flexible length adjusting system. Zip-fly with original Velcro® closure. Double layer seat. MultiCam® patterns take advantage of the way the human eye and brain perceive shape, volume, and color. Since only a very small portion of the human eye perceives color, the brain does the "filling" for the eye. MultiCam®'s unique high-resolution design takes advantage of this principle and helps the viewer "see" the pattern as part of the background. The MultiCam® family of patterns relies more on a blending effect than a traditional contrasting effect to disguise the wearer. This effect allows them to perform well in a wide range of environmental conditions. It also helps maintain pattern effectiveness even at close intervals where low resolution patterns often stand out against the natural environment.